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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Comparison of measured optical image profiles of silicon lines with two different theoretical models

✍ Scribed by Silver, Richard M.; Attota, Ravikiran; Stocker, M.; Jun, Jau-Shi J.; Marx, Egon; Larrabee, Robert D.; Russo, Beth; Davidson, Mark P.; Herr, Daniel J. C.

Book ID: 120885888
Publisher: SPIE
Year: 2002
Weight: 770 KB
Volume: 4689
Category: Article
DOI: 10.1117/12.473479

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