SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep-UV photoresist

✍ Scribed by Wang, Liyuan; Wang, Wenjun; Guo, Xin; Sturtevant, John L.

• Book ID: 120250452
• Publisher: SPIE
• Year: 2004
• Weight: 338 KB
• Volume: 5376
• Category: Article
• DOI: 10.1117/12.534513