SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

✍ Scribed by Joo, Hyun S.; Seo, Dong C.; Kim, Chang M.; Lim, Young T.; Cho, Seong D.; Lee, Jong B.; Song, Ji Y.; Kim, Kyoung M.; Park, Joo H.; Jung, Jae Chang; Shin, Ki S.; Bok, Cheol Kyu; Moon, Seung C.; Sturtevant, John L.

• Book ID: 121084213
• Publisher: SPIE
• Year: 2004
• Weight: 430 KB
• Volume: 5376
• Category: Article
• DOI: 10.1117/12.535117