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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - E-beam proximity effect parameters for sub-100-nm features

✍ Scribed by Mountfield, Keith R.; Eckert, Andrew R.; Yang, XiaoMin; Johns, Earl C.; Sturtevant, John L.

No coin nor oath required. For personal study only.

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