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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Photoresist outgassing: a potential Achilles heel for short-wavelength optical lithography?

✍ Scribed by Kunz, Roderick R.; Sturtevant, John L.

No coin nor oath required. For personal study only.

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