SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Do we need complex resist models for predictive simulation of lithographic process performance?

✍ Scribed by Tollkuhn, Bernd; Erdmann, Andreas; Lammers, Jeroen; Nolscher, Christoph; Semmler, Armin; Sturtevant, John L.

• Book ID: 121400732
• Publisher: SPIE
• Year: 2004
• Weight: 308 KB
• Volume: 5376
• Category: Article
• DOI: 10.1117/12.534045