✦ LIBER ✦

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Advanced model formulations for optical and process proximity correction

✍ Scribed by Beale, Daniel F.; Shiely, James P.; Melvin III, Lawrence L.; Rieger, Michael L.; Smith, Bruce W.

No coin nor oath required. For personal study only.

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