SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - New paradigm in lens metrology for lithographic scanner: evaluation and exploration

✍ Scribed by Lai, Kafai; Gallatin, Gregg M.; van de Kerkhof, Mark A.; de Boeij, Wim; Kok, Haico; Schriever, Martin; Morillo, Jaime D.; Fair, Robert H.; Bennett, Stephanie; Corliss, Daniel A.; Smith, Bruce W.

• Book ID: 120469947
• Publisher: SPIE
• Year: 2004
• Weight: 294 KB
• Volume: 5377
• Category: Article
• DOI: 10.1117/12.536550