𝔖 Bobbio Scriptorium

✦ LIBER ✦

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Immersion microlithography at 193 nm with a Talbot prism interferometer

✍ Scribed by Bourov, Anatoly; Fan, Yongfa; Cropanese, Frank C.; Lafferty, Neal V.; Zavyalova, Lena V.; Kang, Hoyoung; Smith, Bruce W.; Smith, Bruce W.

Book ID: 120466261
Publisher: SPIE
Year: 2004
Weight: 554 KB
Volume: 5377
Category: Article
DOI: 10.1117/12.537350

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Production of novel materials for 157-nm and 193-nm soft pellicles

✍ Zimmerman, Paul A.; van Peski, Chris; Miller, Daniel; Callahan, Ryan P.; Cashion 📂 Article 📅 2004 🏛 SPIE ⚖ 133 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Methods for benchmarking photolithography simulators: part II

✍ Smith, Mark D.; Byers, Jeffrey D.; Mack, Chris A.; Smith, Bruce W. 📂 Article 📅 2004 🏛 SPIE ⚖ 88 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Full optical column characterization of DUV lithographic projection tools

✍ van de Kerkhof, Mark A.; de Boeij, Wim; Kok, Haico; Silova, Marianna; Baselmans, 📂 Article 📅 2004 🏛 SPIE ⚖ 430 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Advanced model formulations for optical and process proximity correction

✍ Beale, Daniel F.; Shiely, James P.; Melvin III, Lawrence L.; Rieger, Michael L.; 📂 Article 📅 2004 🏛 SPIE ⚖ 64 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - 0.85-NA ArF scanner: advancing features and performances

✍ Namba, Atsushi; Uzawa, Shigeyuki; Kotoku, Kenichi; Smith, Bruce W. 📂 Article 📅 2004 🏛 SPIE ⚖ 545 KB

SPIE Proceedings [SPIE Microlithography

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - New paradigm in lens metrology for lithographic scanner: evaluation and exploration

✍ Lai, Kafai; Gallatin, Gregg M.; van de Kerkhof, Mark A.; de Boeij, Wim; Kok, Hai 📂 Article 📅 2004 🏛 SPIE ⚖ 294 KB