SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Investigation of the exposure and bake of a positive acting resist with chemical amplification

✍ Scribed by Ferguson, Richard A.; Spence, Chris A.; Reichmanis, Elsa; Thompson, Larry F.; Neureuther, Andrew R.; Watts, Michael P. C.

• Book ID: 120794220
• Publisher: SPIE
• Year: 1990
• Weight: 587 KB
• Volume: 1262
• Category: Article
• DOI: 10.1117/12.20086