SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Image reversal: a new chemical approach using isoureas

✍ Scribed by Taylor, James W.; Brown, Thomas L.; Bassett, David R.; Watts, Michael P. C.

• Book ID: 120451830
• Publisher: SPIE
• Year: 1990
• Weight: 402 KB
• Volume: 1262
• Category: Article
• DOI: 10.1117/12.20107