SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Models for predicting the index of refraction of compounds at 193 and 589 nm

✍ Scribed by Brainard, Robert L.; Kruger, Seth; Block, Eric; Lin, Qinghuang

• Book ID: 118274986
• Publisher: SPIE
• Year: 2007
• Weight: 231 KB
• Volume: 6519
• Category: Article
• DOI: 10.1117/12.712431