SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Novel anionic photoacid generator (PAGs) and photoresist for sub-50-nm patterning by EUVL and EBL

✍ Scribed by Wang, Mingxing; Lee, Cheng-Tsung; Henderson, Clifford L.; Yueh, Wang; Roberts, Jeanette M.; Gonsalves, Kenneth E.; Lin, Qinghuang

• Book ID: 120446516
• Publisher: SPIE
• Year: 2007
• Weight: 367 KB
• Volume: 6519
• Category: Article
• DOI: 10.1117/12.712143