๐”– Bobbio Scriptorium
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Sources of SIMOX buried oxide leakage

โœ Scribed by M.J. Anc; W.A. Krull


Book ID
103599438
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
291 KB
Volume
28
Category
Article
ISSN
0167-9317

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๐Ÿ“œ SIMILAR VOLUMES


Properties of the buried oxide layer in
โœ A.G. Revesz; H.L. Hughes ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 605 KB

After a short summary of the status of the buried 6x~qCle layer in SIMOX structures as of 1994, this pal~er reviews the developments since then. The main fOf~iCS are as follows: effects of processing condltiOttS, such aS low oxygen dose implantation, add;lionel oxidation; holetrappng behavior and co

Trapping dependent H+ motion in SIMOX bu
โœ P.J Macfarlane; R.E Stahlbush ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 341 KB

The transport characteristics of mobile H ions are examined in SIMOX buried oxides. The H ions are created in the 1 buried oxides by annealing in H gas. The effects of applied oxide field and H concentration are investigated in order to 2 1 1 develop a model for the mechanism of the H motion. Result