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Silicon surface passivation by atomic layer deposited Al[sub 2]O[sub 3]

✍ Scribed by Hoex, B.; Schmidt, J.; Pohl, P.; van de Sanden, M. C. M.; Kessels, W. M. M.

Book ID: 120487853
Publisher: American Institute of Physics
Year: 2008
Tongue: English
Weight: 1006 KB
Volume: 104
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.2963707

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