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Reduction of native oxides on InAs by atomic layer deposited Al[sub 2]O[sub 3] and HfO[sub 2]

✍ Scribed by Timm, R.; Fian, A.; Hjort, M.; Thelander, C.; Lind, E.; Andersen, J. N.; Wernersson, L.-E.; Mikkelsen, A.

Book ID: 121691667
Publisher: American Institute of Physics
Year: 2010
Tongue: English
Weight: 628 KB
Volume: 97
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.3495776

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