✦ LIBER ✦

Interface effect on dielectric constant of HfO[sub 2]∕Al[sub 2]O[sub 3] nanolaminate films deposited by plasma-enhanced atomic layer deposition

✍ Scribed by Park, Pan Kwi; Cha, Eun-Soo; Kang, Sang-Won

Book ID: 121482247
Publisher: American Institute of Physics
Year: 2007
Tongue: English
Weight: 460 KB
Volume: 90
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2746416

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Giant dielectric constant dominated by M

Giant dielectric constant dominated by MaxwellâWagner relaxation in Al[sub 2]O[sub 3]/TiO[sub 2] nanolaminates synthesized by atomic layer deposition

✍ Li, Wei; Auciello, Orlando; Premnath, Ramesh N.; Kabius, Bernd 📂 Article 📅 2010 🏛 American Institute of Physics 🌐 English ⚖ 766 KB

Reduction of native oxides on InAs by at

Reduction of native oxides on InAs by atomic layer deposited Al[sub 2]O[sub 3] and HfO[sub 2]

✍ Timm, R.; Fian, A.; Hjort, M.; Thelander, C.; Lind, E.; Andersen, J. N.; Werners 📂 Article 📅 2010 🏛 American Institute of Physics 🌐 English ⚖ 628 KB

MIM capacitors using atomic-layer-deposi

MIM capacitors using atomic-layer-deposited high-/spl kappa/ (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ dielectrics

✍ Hang Hu, ; Chunxiang Zhu, ; Xiongfei Yu, ; Chin, A.; Li, M.F.; Byung Jin Cho, ; 📂 Article 📅 2003 🏛 IEEE 🌐 English ⚖ 302 KB

High-κ HfO[sub 2] Nanocrystal Memory Cap

High-κ HfO[sub 2] Nanocrystal Memory Capacitors Prepared by Phase Separation of Atomic-Layer-Deposited HfO[sub 2]∕Al[sub 2]O[sub 3] Nanomixtures

✍ Maikap, S.; Das, Atanu; Wang, T.-Y.; Tien, T.-C.; Chang, L.-B. 📂 Article 📅 2009 🏛 The Electrochemical Society 🌐 English ⚖ 862 KB

Conformal Al[sub 2]O[sub 3] dielectric l

Conformal Al[sub 2]O[sub 3] dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

✍ Lee, Bongki; Park, Seong-Yong; Kim, Hyun-Chul; Cho, KyeongJae; Vogel, Eric M.; K 📂 Article 📅 2008 🏛 American Institute of Physics 🌐 English ⚖ 505 KB

Influence of single and double depositio

Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al[sub 2]O[sub 3] dielectric thin films on silicon

✍ DuenÌas, S.; CastaÌn, H.; GarciÌa, H.; de Castro, A.; BailoÌn, L.; Kukli, K. 📂 Article 📅 2006 🏛 American Institute of Physics 🌐 English ⚖ 1015 KB