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Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al[sub 2]O[sub 3] dielectric thin films on silicon

✍ Scribed by DuenÌas, S.; CastaÌn, H.; GarciÌa, H.; de Castro, A.; BailoÌn, L.; Kukli, K.; Aidla, A.; Aarik, J.; MaÌndar, H.; Uustare, T.; Lu, J.; HaÌrsta, A.

Book ID: 120328968
Publisher: American Institute of Physics
Year: 2006
Tongue: English
Weight: 1015 KB
Volume: 99
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.2177383

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