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MIM capacitors using atomic-layer-deposited high-/spl kappa/ (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ dielectrics

✍ Scribed by Hang Hu, ; Chunxiang Zhu, ; Xiongfei Yu, ; Chin, A.; Li, M.F.; Byung Jin Cho, ; Dim-Lee Kwong, ; Foo, P.D.; Ming Bin Yu, ; Xinye Liu, ; Winkler, J.

Book ID: 120003718
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 302 KB
Volume: 24
Category: Article
ISSN: 0741-3106
DOI: 10.1109/LED.2002.807703

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