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Conformal Al[sub 2]O[sub 3] dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

✍ Scribed by Lee, Bongki; Park, Seong-Yong; Kim, Hyun-Chul; Cho, KyeongJae; Vogel, Eric M.; Kim, Moon J.; Wallace, Robert M.; Kim, Jiyoung

Book ID: 121750732
Publisher: American Institute of Physics
Year: 2008
Tongue: English
Weight: 505 KB
Volume: 92
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2928228

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