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Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al[sub 2]O[sub 3]

✍ Scribed by Hoex, B.; Heil, S. B. S.; Langereis, E.; van de Sanden, M. C. M.; Kessels, W. M. M.

Book ID: 120995421
Publisher: American Institute of Physics
Year: 2006
Tongue: English
Weight: 507 KB
Volume: 89
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2240736

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