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Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing

✍ Scribed by A. Pecora; L. Maiolo; A. Bonfiglietti; M. Cuscunà; F. Mecarini; L. Mariucci; G. Fortunato; N.D. Young

Book ID: 104057813
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 202 KB
Volume: 45
Category: Article
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2004.09.012

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