Post-deposition processing of low temperature PECVD silicon dioxide films for enhanced stress stability

✍ Scribed by M.S Haque; H.A Naseem; W.D Brown

• Book ID: 114086247
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 193 KB
• Volume: 308-309
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(97)00542-7