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Superior structural and electronic properties for amorphous silicon–germanium alloys deposited by a low temperature hot wire chemical vapor deposition process

✍ Scribed by Shouvik Datta; Yueqin Xu; A.H. Mahan; Howard M. Branz; J. David Cohen


Book ID
116668928
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
156 KB
Volume
352
Category
Article
ISSN
0022-3093

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