✦ LIBER ✦

Silicon containing resists with positive and negative tone

✍ Scribed by B.A.C. Rousseeuw; R. Puyenbroek; E. van der Drift; J.C. van de Grampel

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 700 KB
Volume: 27
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)00127-g

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Positive- and Negative-Tone CVD Polyacry

Positive- and Negative-Tone CVD Polyacrylic Electron-Beam Resists Developable by Supercritical CO2

✍ Y. Mao; N. M. Felix; P. T. Nguyen; C. K. Ober; K. K. Gleason 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 222 KB

Novel Positive-Tone Chemically Amplified

Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains

✍ H. Wu; K. E. Gonsalves 📂 Article 📅 2001 🏛 John Wiley and Sons 🌐 English ⚖ 157 KB

Development and structuring of combined

Development and structuring of combined positive-negative/negative-positive resists using laser ablation as positive dry etching technique

✍ T. Lippert; J. Wei; A. Wokaun; N. Hoogen; O. Nuyken 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 78 KB

Comparison of negative tone resists NEB2

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography

✍ A.J. van Dodewaard; W.S.M.M. Ketelaars; R.F.M. Roes; J.A.J. Kwinten; F.C.M.J.M. 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 596 KB

The negative tone resists NEB22 and UVN30 have been studied for their contrast and resolution in e-beam lithography, as well as in 248 nm DUV lithography. Also, their etch resistances have been determined in 02, SF6/He and CHF3/O 2 plasmas in comparison with novolac resists. NEB22 shows a slightly h

Negative resists of silicone-containing

Negative resists of silicone-containing graft polymer for bilayer resist system

✍ Yoshio Tachibana; Yasutaro Yasuda; Tetsuji Jitsumatsu; Ken'ichi Koseki; Tsuguo Y 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 594 KB

A triphenylene derivative as a novel neg

A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

✍ T. Tada; T. Kanayama; A.P.G. Robinson; R.E. Palmer; M.T. Allen; J.A. Preece; K.D 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 601 KB

We show that a triphenylene derivative, 2,3,6,7,10,11-hexapentyl-oxytriphenylene, acts as an electron beam resist of 10-nm resolution with high dry-etch durability. The triphenylene derivative exhibited positive and negative behaviors depending on the dose and developers. When pentanol was used as a