In this paper, we prepared a silicon-containing polymer nanosheet, poly(neo-pentylmethacrylamide-co-4-(trimethylsilyl)phenyl)methacrylamide (p(nPMA/SiPhMA)), for positive-tone photoresist application. p(nPMA/SiPhMA) forms a stable monolayer at the air-water interface and the polymer monolayer can be
โฆ LIBER โฆ
Negative resists of silicone-containing graft polymer for bilayer resist system
โ Scribed by Yoshio Tachibana; Yasutaro Yasuda; Tetsuji Jitsumatsu; Ken'ichi Koseki; Tsuguo Yamaoka
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 594 KB
- Volume
- 31
- Category
- Article
- ISSN
- 0032-3861
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