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Room-Temperature Inductively Coupled Plasma Etching of InP Using Cl 2 /N 2 and Cl 2 /CH 4 /H 2

✍ Scribed by Chee-Wei, Lee; Mee-Koy, Chin

Book ID: 121018643
Publisher: Institute of Physics
Year: 2006
Tongue: English
Weight: 296 KB
Volume: 23
Category: Article
ISSN: 0256-307X
DOI: 10.1088/0256-307X/23/4/039

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