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Characteristics of Ir etching using Ar/Cl2inductively coupled plasmas

✍ Scribed by SE-GEUN PARK; CHIN-WOO KIM; HO-YOUNG SONG; HYOUN WOO KIM; JU HYUN MYUNG; SUKHO JOO; SOON OH PARK; KYU-MANN LEE

No coin nor oath required. For personal study only.

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