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Low bias dry etching of III-nitrides in Cl2-based inductively coupled plasmas

✍ Scribed by Hyun Cho; C. B. Vartuli; S. M. Donovan; J. D. Mackenzie; C. R. Abernathy; S. J. Pearton; R. J. Shul; C. Constantine

No coin nor oath required. For personal study only.

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