✦ LIBER ✦
Correlation of Optical Emission and Ion Flux with GaN Etch Rate in Inductively Coupled Ar/Cl2 Plasma Etching
✍ Scribed by S.A. Rizvi; P.D. Maguire; C.M.O. Mahony; O.A. Okpalugo; C.S. Corr; W.G. Graham; S.M. Morley
- Publisher
- John Wiley and Sons
- Year
- 2003
- Tongue
- English
- Weight
- 111 KB
- Volume
- 0
- Category
- Article
- ISSN
- 1862-6351
No coin nor oath required. For personal study only.