Effect of etching on dielectric constant and surface composition of SiCOH low-k films in inductively coupled fluorocarbon plasmas

✍ Scribed by Sungwoo Lee; Jihyung Woo; Donggeun Jung; Jaeyoung Yang; Jin-hyo Boo; Hyoungsub Kim; Heeyeop Chae

• Book ID: 108290378
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 726 KB
• Volume: 517
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2009.01.104