✦ LIBER ✦
Effect of low-frequency power on etching of SiCOH low-k films in CHF3 13.56 MHz/2 MHz dual-frequency capacitively coupled plasma
✍ Scribed by Chao Ye; Yijun Xu; Xiaojiang Huang; Zhenyu Xing; Jing Yuan; Zhaoyuan Ning
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 540 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0167-9317
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