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Etching of As- and P-based III–V semiconductors in a planar inductively coupled BCl3/Ar plasma

✍ Scribed by J. W. Lee; W. T. Lim; I. K. Baek; S. R. Yoo; M. H. Jeon; G. S. Cho; S. J. Pearton


Book ID
107453195
Publisher
Springer US
Year
2004
Tongue
English
Weight
739 KB
Volume
33
Category
Article
ISSN
0361-5235

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