✦ LIBER ✦

Inductively coupled plasma etching of III–V antimonides in BCl3/SiCl4 etch chemistry

✍ Scribed by K. Swaminathan; P.E. Janardhanan; O.V. Sulima

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

BCl3/Ne etching of III–V semiconductors

✍ W.T. Lim; I.K. Baek; J.W. Lee; E.S. Lee; M.H. Jeon; G.S. Cho; S.J. Pearton 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 352 KB

Inductively coupled plasma etching of II

✍ J.W Lee; E.S Lambers; C.R Abernathy; S.J Pearton; R.J Shul; F Ren; W.S Hobson; C 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 881 KB

Etching of As- and P-based III–V semicon

✍ J. W. Lee; W. T. Lim; I. K. Baek; S. R. Yoo; M. H. Jeon; G. S. Cho; S. J. Pearto 📂 Article 📅 2004 🏛 Springer US 🌐 English ⚖ 739 KB

Comparison of planar inductively coupled

✍ J.W Lee; Y.T Lim; I.K Baek; S.Y Yoo; G.S Cho; M.H Jeoin; J.Y Leem; S.J Pearton 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 400 KB

On the etching mechanism of ZrO2 thin fi

✍ Mansu Kim; Nam-Ki Min; Sun Jin Yun; Hyun Woo Lee; Alexander Efremov; Kwang-Ho Kw 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 205 KB

Etching profile of silicon carbide in a

✍ Byungwhan Kim; Suk Yong Lee; Byung-Teak Lee 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 283 KB