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BCl3/Ne etching of III–V semiconductors in a planar inductively coupled plasma reactor

✍ Scribed by W.T. Lim; I.K. Baek; J.W. Lee; E.S. Lee; M.H. Jeon; G.S. Cho; S.J. Pearton

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 352 KB
Volume: 222
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2003.08.009

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