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Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

✍ Scribed by J.W Lee; Y.T Lim; I.K Baek; S.Y Yoo; G.S Cho; M.H Jeoin; J.Y Leem; S.J Pearton

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 400 KB
Volume: 233
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2004.04.008

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