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Electron cyclotron resonance plasma etching of InP and related materials in BCl3

✍ Scribed by F Ren; W.S Hobson; J.M Kuo; J.R Lothian; J Lopata; S.J Pearton; J.A Caballero

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
356 KB
Volume
39
Category
Article
ISSN
0038-1101

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## Abstract Boron nitride (BN) films with high crystallinity and phase purity (>80 %) in the cubic phase were synthesized over large areas using fluorine chemistry and electron–cyclotron resonance (ECR) microwave plasma. Plasma‐enhanced fluorine chemistry was provided by a complex H~2~–BF~3~–N~2~–A