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Etching characteristics of TaN thin film using an inductively coupled plasma

โœ Scribed by Doo-Seung Um; Jong-Chang Woo; Chang-Il Kim

Book ID
108278698
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
779 KB
Volume
205
Category
Article
ISSN
0257-8972

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u ร€ 2u scan for the as-deposited FePt film. The diffraction peaks associated with the formation of L1 0 ordered structure were clearly observed . Furthermore, the magnetic property of the film was investigated employing a superconducting quantum interference device (SQUID) magnetometer with the magn