Reactive ion etching of FePt using inductively coupled plasma

✍ Scribed by Tomomi Kanazawa; Kohei Ono; Masato Takenaka; Masashi Yamazaki; Kenichi Masuda; Shiho Cho; Takayuki Wakayama; Fumiyoshi Takano; Hiro Akinaga

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 608 KB
• Volume: 254
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2008.03.155

✦ Synopsis

u À 2u scan for the as-deposited FePt film. The diffraction peaks associated with the formation of L1 0 ordered structure were clearly observed . Furthermore, the magnetic property of the film was investigated employing a superconducting quantum interference device (SQUID) magnetometer with the magnetic field applied perpendicular to the film plane. Fig. demonstrates the