Inductively coupled plasma reactive ion etching of sapphire using C2F6- and NF3-based gas mixtures

✍ Scribed by Dong-Jin Kang; Il-Soo Kim; Jong-Ha Moon; Byung-Teak Lee

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 698 KB
• Volume: 11
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2008.05.002