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Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

โœ Scribed by S.W. Na; M.H. Shin; Y.M. Chung; J.G. Han; S.H. Jeung; J.H. Boo; N.-E. Lee

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
566 KB
Volume
83
Category
Article
ISSN
0167-9317

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