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Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmas

✍ Scribed by J.H. Park; N.-E. Lee; Jaechan Lee; J.S. Park; H.D. Park

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 307 KB
Volume: 82
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.07.006

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