Etch Characteristics of GaN Using Inductively Coupled Cl2/HBr and Cl2/Ar Plasmas

✍ Scribed by Kim, H. S.; Lee, Y. J.; Lee, Y. H.; Lee, J. W.; Yoo, M. C.; Kim, T. I.; Yeom, G. Y.

• Book ID: 115492359
• Publisher: Cambridge University Press
• Year: 1997
• Weight: 393 KB
• Volume: 468
• Category: Article
• ISSN: 0272-9172
• DOI: 10.1557/proc-468-367