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Evolution of surface roughness of AlN and GaN induced by inductively coupled Cl2/Ar plasma etching

✍ Scribed by Zhu, K.; Kuryatkov, V.; Borisov, B.; Yun, J.; Kipshidze, G.; Nikishin, S. A.; Temkin, H.; Aurongzeb, D.; Holtz, M.

No coin nor oath required. For personal study only.

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