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Etching Characteristics and Mechanisms of TiO2Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas

✍ Scribed by Hanbyeol Jang; Alexander Efremov; Daehee Kim; Sungchil Kang; Sun Jin Yun; Kwang-Ho Kwon

No coin nor oath required. For personal study only.

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