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Dry etching of germanium using inductively coupled Ar/CCl2F2/Cl2plasma

✍ Scribed by Taek Sung Kim; Sang-Sik Choi; Mi Im Shin; Tae Soo Jeong; Sukil Kang; Chel-Jong Choi; Kyu-Hwan Shim

Book ID: 111857057
Publisher: The Korean Institute of Metals and Materials
Year: 2010
Tongue: English
Weight: 611 KB
Volume: 6
Category: Article
ISSN: 1738-8090
DOI: 10.3365/eml.2010.03.035

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