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Cl[sub 2]-Based Inductively Coupled Plasma Etching of NiFe and Related Materials

✍ Scribed by Jung, K. B.

Book ID: 121860577
Publisher: The Electrochemical Society
Year: 1998
Tongue: English
Weight: 802 KB
Volume: 145
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.1838908

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