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Vertical and Smooth, etching of InP by Cl 2 /CH 4 /Ar Inductively Coupled Plasma at Room Temperature

✍ Scribed by Chang-Zheng, Sun; Jin-Bo, Zhou; Bing, Xiong; Jian, Wang; Yi, Luo

Book ID: 121200626
Publisher: Institute of Physics
Year: 2003
Tongue: English
Weight: 227 KB
Volume: 20
Category: Article
ISSN: 0256-307X
DOI: 10.1088/0256-307X/20/8/338

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