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Response surface study of inductively coupled plasma etching of GaAs/AlGaAs in BCl[sub 3]/Cl[sub 2]

✍ Scribed by Agarwala, Sambhu; King, Oliver; Horst, Scott; Wilson, Rick; Stone, Dennis; Dagenais, Mario; Chen, Y. J.

Book ID: 125438750
Publisher: AVS (American Vacuum Society)
Year: 1999
Tongue: English
Weight: 511 KB
Volume: 17
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.581549

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