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Plasma etching selectivity of ZrO[sub 2] to Si in BCl[sub 3]/Cl[sub 2] plasmas

✍ Scribed by Sha, Lin; Chang, Jane P.

Book ID: 124100190
Publisher: AVS (American Vacuum Society)
Year: 2003
Tongue: English
Weight: 428 KB
Volume: 21
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.1615975

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